Technology · Conference

SPIE Photomask Technology + EUV Lithography Monterey

Name: SPIE Photomask Technology + EUV Lithography Monterey
Start: 2026-09-08
End: 2026-09-11
Location: Monterey Marriott

A premier technical conference for the semiconductor and lithography industry.

Tue, 8 Sep 2026 – Fri, 11 Sep 2026 Monterey Marriott Monterey , California

The SPIE Photomask Technology + EUV Lithography conference is a vital gathering for professionals in the semiconductor industry. Held in Monterey, California, this event brings together industry partners to collaborate on solving complex technical problems, reducing costs, and expanding manufacturing capabilities. Attendees will participate in a focused technical program featuring the latest advancements in lithography. It is an essential opportunity for networking and professional development within the global technology sector.

What to Expect

Attendees can expect a comprehensive technical program, expert-led sessions, and opportunities to connect with industry partners and peers.

Who Should Attend

Semiconductor engineers
Lithography researchers
Industry executives
Technology developers
Manufacturing specialists

Agenda Overview

The conference spans four days, featuring technical sessions and collaborative workshops.

Venue & Address

Monterey Marriott

350 Calle Principal
Monterey , California – 93940
United States

Organizer

SPIE · Professional Society

The international society for optics and photonics.

Frequently Asked Questions

When is the conference?

September 8-11, 2026.

Where is it held?

Monterey Marriott and Monterey Conference Center, Monterey, CA.

Who organizes this?

SPIE.

What is the focus?

Photomask technology and EUV lithography.

Is registration required?

Yes, please visit the SPIE website for details.

Are there networking events?

Yes, the event facilitates industry partner collaboration.